Effects of inhibitor on chemically deposited ZnO thin films

Abstract

The zinc oxide thin films were obtained by using the chemical bath deposition method. In the study, sodium sulfite (Na2SO3) was used as an inhibitor at varying rates of 0, 0.01, 0.03 and 0.05 M. The reaction rates were decreased by using Na2SO3 as an inhibitor. According to the X-ray diffractometer results, the inhibitor affected crystallite sizes significantly. The crystallite sizes were decreased from 70 to 11 nm. The optical properties of the films were analyzed by using absorbance measurements. According to the absorbance, the bandgaps were increased from 2.65 to 3.68 eV. The surface resistivity of the films decreased from 3.162 to 0.196 kΩmm.