Deposition and wear resistance of composite TiBC-SiC coatings on Si wafer by thermal plasma CVD
Author:
Affiliation:
1. Graduate School of Engineering, Hokkaido University
2. Research & Development Department, Hokkaido Electric Power Co., Ltd.
3. Hokkaido Sumiden Precision Industries Ltd.
Publisher
Ceramic Society of Japan
Subject
Materials Chemistry,Condensed Matter Physics,General Chemistry,Ceramics and Composites
Link
http://www.jstage.jst.go.jp/article/jcersj2/117/1364/117_1364_415/_pdf
Reference24 articles.
1. 1) "Carbide, Nitride and Boride Materials Synthesis and Processing," Ed. by A. W. Weimer, Chapman & Hall, London (1997) Appendices C.
2. Development of titanium diboride coatings deposited by PACVD
3. Process-Structure-Reflectance Correlations for TiB2 Films Prepared by Chemical Vapor Deposition
4. 4) M. J. Son, S. S. Kang, E.-A. Lee and K. H. Kim, J. Mat. Processing Technol., 130-131, 266-271 (2002).
5. Chemical-vapor deposition of wear resistant hard coatings in the Ti–B–C–N system: properties and metal-cutting tests
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3. Thermal plasma CVD and wear resistance of double layered Ti–Si–B–C/Ti–B–C coatings on WC–Co cutting tools with various roughness;Surface and Coatings Technology;2010-02
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