Preparation of PbTiO3 Thin Films by Liquid Source Misted Chemical Vapor Deposition (LSMCVD) Method
Author:
Affiliation:
1. Dept. of New Materials Engineering, Chonbuk National University
2. Research Institute of Advanced Materials Development
3. Dept. of Metallurgy and Ceramics Science, Tokyo Institute of Technology
4. Tokyo National College of Technology
Publisher
Ceramic Society of Japan
Subject
Materials Chemistry,Condensed Matter Physics,General Chemistry,Ceramics and Composites
Link
http://www.jstage.jst.go.jp/article/jcersj/114/1331/114_1331_603/_pdf
Reference15 articles.
1. Electrical characteristics of ferroelectric PZT thin films for DRAM applications
2. Ferroelectric thin films for electronic applications
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