Active Plasma Species in TiN Film Formation Process by Plasma CVD Method
Author:
Affiliation:
1. RIMES Ltd., c/o Central Research Laboratory, Sumitomo Metal Mining Co., Ltd.
2. Research Center for Advanced Technologies, The Japan Steel Works Co., Ltd.
3. Central Research Laboratory, Sumitomo Metal Mining Co., Ltd.
Publisher
Ceramic Society of Japan
Subject
Materials Chemistry,Condensed Matter Physics,General Chemistry,Ceramics and Composites
Link
http://www.jstage.jst.go.jp/article/jcersj1988/100/1166/100_1166_1184/_pdf
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2. A spectroscopic study into the decomposition process of titanium isopropoxide in the nitrogen–hydrogen 100kHz low-pressure plasma;Vacuum;2008-02
3. Surface Modification by Duplex Process Consisted of Radical Nitriding and PVD;Materials Science Forum;2003-08
4. An analysis of the TiN plasmachemical vapor deposition process based on optical emission spectroscopy measurements;Thin Solid Films;2001-11
5. Dominant plasma species for TiN film formation by plasma CVD;Journal of Physics D: Applied Physics;1997-09-07
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