Separating and Identifying the Active Ingredient of a Stain Resist Compound

Author:

Bauers Maureen1,Keown Robert W.1,Malone C. Paul2

Affiliation:

1. Department of Food Science, University of Delaware, Newark, Delaware 19716, U.S.A.

2. Department of Textiles, Design and Consumer Economics, University of Delaware, Newark, Delaware 19716, U.S.A.

Abstract

A sulfonated aromatic stain resist chemical consisting of the condensation product of phenol sulfonic acid, dihydroxy diphenol sulfone, and formaldehyde was separated by semi-prep scale reverse phase high pressure liquid chromatography. Stain resistance activity was demonstrated in only two of the ten fractions that were isolated, with very slight activity in another two fractions. The active stain resist component is a low molecular weight condensation product of the sulfonic acid and sulfone with the phenolic groups converted to alkyl aryl ethers. The active component comprises only about 10% of the total weight of the stain resist chemical.

Publisher

SAGE Publications

Subject

Polymers and Plastics,Chemical Engineering (miscellaneous)

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Active Ingredients of Stain-Resist Compounds;Textile Research Journal;1994-12

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3