Affiliation:
1. School of Computer Science and Technology, Tianjin University, P.R. China
2. Tianjin Key Laboratory of Cognitive Computing and Application, P.R. China
Abstract
Generating batik printing patterns is an ancient and unique dye-resistant printing technique. Due to the dip dyeing of the cloth with wax in the dyes, the wax as a reserve dyeing agent cracks naturally, and the dyes permeate into the cloth along the cracks. It forms a natural texture and generates a unique and beautiful artwork that is difficult to produce manually. According to the characteristics of the batik printing patterns with cracks, we developed a specific method for simulation of the batik printing patterns with cracks that are relevant or not relevant to the batik patterns (BPPCNR or BPPCR). For the simulation of the process of the extension of the crack, we adapted the method of solving two-dimensional crack fracture based on the extended finite element method (EFEM) in the field of fracture mechanics. We achieved the results of cracks with different shades of colors for batik printing patterns with cracks that are not relevant to the batik patterns (BPPCNR). For the batik printing patterns with cracks that are relevant to the batik patterns (BPPCR), we proposed the method combining the distance transformation algorithm and EFEM, which can quickly define the initial cracks by the distance transformation image of the input printing patterns, and simulated the process of the extension of the crack by the EFEM. Moreover, we proposed the definition of a local axis parallel extension area that can greatly reduce the computation overhead. Experiments show that our method is effective in that it can realize various satisfying vivid batik printing patterns with cracks.
Subject
Polymers and Plastics,Chemical Engineering (miscellaneous)
Cited by
5 articles.
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