Growth of single crystal silicon carbide by liquid phase epitaxy using samarium/cobalt as unique solvent

Author:

Wang Sheng-Chang1,Nayak Pramoda K2,Chen You-Ling2,Sung James C3,Huang Jow-Lay245

Affiliation:

1. Department of Mechanical Engineering, Southern Taiwan University, Taiwan

2. Department of Materials Science and Engineering, National Cheng Kung University, Taiwan

3. KINIK Company, Taiwan

4. Center for Micro/Nano Science and Technology, National Cheng Kung University, Taiwan

5. Research Center for Energy Technology and Strategy, National Cheng Kung University, Taiwan

Abstract

An approach for synthesizing single crystal silicon carbide at low temperature using liquid phase epitaxy is proposed. A mixture of samarium and cobalt (Sm:Co = 64:36 at.%) was used as a unique solvent in this synthesis process. Electron microscopy indicates the epitaxial growth of single crystal silicon carbide with a thickness of 4 µm over a silicon wafer followed by the formation of polycrystalline silicon carbide and silicon carbide whiskers. Some growth mechanisms are proposed to explain the formation of silicon carbide. It is hypothesized that the single crystal silicon carbide grew from the liquid phase, whereas polycrystalline silicon carbide whiskers grew via the vapor–liquid–solid process.

Publisher

SAGE Publications

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,General Materials Science

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Synthesis and Applications of Borides, Carbides, Phosphides, and Nitrides;Handbook on Synthesis Strategies for Advanced Materials;2021

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