Constitutive Modeling of Photostrictive Materials and Design Optimization of Microcantilevers-Reference-Cited by-同舟云学术

Constitutive Modeling of Photostrictive Materials and Design Optimization of Microcantilevers

Published:2009-05-26 Issue:12 Volume:20 Page:1425-1438
ISSN:1045-389X
Container-title:Journal of Intelligent Material Systems and Structures
language:en
Short-container-title:Journal of Intelligent Material Systems and Structures

Author:

Quantian Luo ¹,Liyong Tong ²

Affiliation:

1. School of Aerospace, Mechanical and Mechatronic Engineering The University of Sydney, NSW 2006, Australia

2. School of Aerospace, Mechanical and Mechatronic Engineering The University of Sydney, NSW 2006, Australia,

Abstract

This article presents constitutive models for photo-induced strains in photostrictive materials and an optimal design of microcantilevers driven by light illumination. Behaviors of photo-induced strains in semiconductors and polymeric materials are reviewed first, and then new phenomenological constitutive models are developed that depict two distinctive features of photo-induced strain profile: (a) dependence on variation of light intensity which decreases with the depth measured from the illuminated surface due to light attenuation and energy absorption; and (b) anisotropy or dependence on direction of light polarization. On the basis of the constitutive modeling of photo-induced strain in wafers, design optimization of microcantilevers is then investigated for both geometrically linear and non-linear deformations.

Publisher

SAGE Publications

Subject

Mechanical Engineering,General Materials Science

Link

http://journals.sagepub.com/doi/pdf/10.1177/1045389X09103224

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