Yaw error correction of ultra-precision stage for scanning beam interference lithography systems-Reference-Cited by-同舟云学术

Yaw error correction of ultra-precision stage for scanning beam interference lithography systems

Published:2018-04-02 Issue:7 Volume:232 Page:869-878
ISSN:0959-6518
Container-title:Proceedings of the Institution of Mechanical Engineers, Part I: Journal of Systems and Control Engineering
language:en
Short-container-title:Proceedings of the Institution of Mechanical Engineers, Part I: Journal of Systems and Control Engineering

Author:

Lu Sen¹²,Yang Kaiming¹²,Zhu Yu¹²,Wang Leijie¹²,Zhang Ming¹²,Yang Jin³

Affiliation:

1. State Key Laboratory of Tribology, Department of Mechanical Engineering, Tsinghua University, Beijing, China

2. Beijing Key Laboratory of Precision/Ultra-precision Manufacturing Equipments and Control, Department of Mechanical Engineering, Tsinghua University, Beijing, China

3. Basic Technology Research Department, Dongfeng Commercial Vehicle Technical Center, Wuhan, China

Abstract

The stage yaw error is a key factor affecting the phase distortion of gratings produced by scanning beam interference lithography system. In order to solve this problem, a coarse-fine dual-stage mechanism is proposed, in which an ultra-precision fine positioning stage with yaw error correction function is developed. To achieve nanoscale positioning and sub-microradian yaw motion accuracy, four Lorentz motors are used to drive the fine stage. The internal coupling factors and the mechanism of Lorentz motors motion control are analyzed. Besides, the Abbe error caused by the yaw error is investigated. Positioning and scanning experiments are conducted and the outcomes show that maximum yaw error is 0.33 μrad during constant velocity scanning, which completely meets the grating fabrication requirements.

Funder

Foundation of the National Science and Technology Major Project of China

Publisher

SAGE Publications

Subject

Mechanical Engineering,Control and Systems Engineering

Link

http://journals.sagepub.com/doi/pdf/10.1177/0959651818766197

Reference11 articles.

1. Sub-100 nm metrology using interferometrically produced fiducials

2. Parallel laser writing system with scanning Dammann lithography

3. Grating imaging scanning lithography

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