Adsorption, X-ray diffraction, photoelectron, and atomic emission spectroscopy benchmark studies for the eighth industrial fluid properties simulation challenge-Reference-Cited by-同舟云学术

Adsorption, X-ray diffraction, photoelectron, and atomic emission spectroscopy benchmark studies for the eighth industrial fluid properties simulation challenge

Published:2016-01-27 Issue:1 Volume:34 Page:13-41
ISSN:0263-6174
Container-title:Adsorption Science & Technology
language:en
Short-container-title:Adsorption Science & Technology

Author:

Ross Richard B¹,Aeschliman David B¹,Ahmad Riaz²,Brennan John K³,Brostrom Myles L¹,Frankel Kevin A¹,Moore Jonathan D⁴,Moore Joshua D³,Mountain Raymond D⁵,Poirier Derrick M¹,Thommes Matthias²,Shen Vincent K⁵,Schultz Nathan E¹,Siderius Daniel W⁵,Smith Kenneth D⁶

Affiliation:

1. 3M Company, St. Paul, MN, USA

2. Quantachrome Instruments, Boynton Beach, FL, USA

3. Weapons and Materials Research Directorate, U.S. Army Research Lab, Aberdeen Proving Ground, MD, USA

4. The Dow Chemical Company, Midland, MI, USA

5. National Institute of Standards and Technology, Gaithersburg, MD, USA

6. United Technologies Research Center, East Hartford, CT, USA

Publisher

Hindawi Limited

Subject

Surfaces and Interfaces,General Chemical Engineering,General Chemistry

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