Interferometric testing of optical surfaces at its current limit-Reference-Cited by-同舟云学术

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Interferometric testing of optical surfaces at its current limit

Published:2001 Issue:9 Volume:112 Page:392-398
ISSN:0030-4026
Container-title:Optik
language:en
Short-container-title:Optik

Author:

Dörband Bernd,Seitz Günther

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference12 articles.

1. Gwyn C: Extreme Ultraviolet Lithography. White Paper from EUV LLC (1998) P.O. Box 969, M-9911 Livermore, CA 94551–0069

2. Extreme Ultraviolet Lithography. OSA Technical Digest, Optical Society of America, Washington DC 1996

3. Interferometry with Laser Diodes;Hariharan;SPIE Proc.,1991

4. Continuously Tunable Diode Lasers;Day;Lasers & Optronics,1993

5. The new Zeiss Interferometer;Küchel;Proc SPIE,1990

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