Author:
KAKIUCHI Hiroaki,YOSHIO Kumayasu,YASUTAKE Kiyoshi,TAKEUCHI Akihiro,HIROSE Kikuji,MORI Yuzo
Publisher
Japan Society for Precision Engineering
Reference6 articles.
1. 4) H. Kawabe, Y. Mori, K. Yoshii, T. Kataoka, K. Yasutake, K. Endo, K. Yamauchi, K. Yamamura and H. Kakiuchi : Low Temperature Growth of Polycrystalline Silicon Films by Plasma Chemical Vapor Deposition under Higher Pressure than Atmospheric Pressure, Proc. 7th Int. Prec. Eng. Seminar, (1993) 554.
2. 5) K. Nakazawa, H. Arai and S. Kohda : Mechanism of a Hydrogenated Polycrystalline Silicon in Hydrogen Plasma Annealing, Appl. Phys. Lett., 51 (1987) 1623.