In-Line Voltage Contrast Inspection of Ungrounded Chain Test Structures for Timely and Detailed Characterization of Contact and Via Yield Loss-Reference-Cited by-同舟云学术

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In-Line Voltage Contrast Inspection of Ungrounded Chain Test Structures for Timely and Detailed Characterization of Contact and Via Yield Loss

Published:2005-10-01 Issue: Volume: Page:
ISSN:0890-1740
Container-title:International Symposium for Testing and Failure Analysis
language:
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Author:

Patterson Oliver D.¹,Wildman Horatio¹,Ache Alex¹,Wu Kevin T.²

Affiliation:

1. IBM Corporation, Hopewell Junction, NY, USA

2. KLA-Tencor, Hopewell Junction, NY, USA

Abstract

Abstract This paper shows that in-line voltage contrast inspection can be used to monitor and debug mechanisms causing via and contact opens using ungrounded chain test structures. This opens up a large number of new opportunities to the benefits of in-line VC inspection. A theory explaining the VC appearance of a broken chain is proposed and experimentally verified. The methodology used at IBM’s 300mm fab to apply this phenomenon is described along with some use cases.

Publisher

ASM International

Link

http://dl.asminternational.org/istfa/proceedings-pdf/doi/10.31399/asm.cp.istfa2005p0401/419866/istfa2005p0401.pdf

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1. Voltage contrast determination of design rules at the limits of EUV single patterning;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-10-19

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