Nanoscale 3D X-ray Microscopy for High Density Multi-Chip Packaging FA

Author:

Schmidt Christian1,Hartfield Cheryl1,Kelly Stephen T.1,England Luke2,Kannan Sukeshwar2

Affiliation:

1. Carl Zeiss SMT Process Control Solutions, Pleasanton, California, USA

2. GLOBALFOUNDRIES, New York, USA

Abstract

Abstract An effective method is presented to locate certain failure sites on exposed junction of insulated-gate bipolar transistor (IGBT) devices. High emitter to collector leakage current, hereafter called ICESR, is an IGBT failure mode. The leakage current is typically related to the exposed P+/N+ junction on the die sidewall. Solder die attach residue bridging or silicon damage at this exposed P+/N+ junction are common causes of ICESR leakage. The die attach residue can be dislodged during decapsulation resulting in loss of failure information. A failure analysis flow will be described to precisely locate the ICESR leakage site without disturbing any possible die attach residue.

Publisher

ASM International

Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Failure Analysis in Advanced Driver Assistance Systems;Advanced Driver Assistance Systems and Autonomous Vehicles;2022

2. 3D X-ray Microscope (XRM) Applied to Semiconductor Embedded in Substrate Defect Analysis;2021 16th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT);2021-12-21

3. Preparing TEM Specimens and Atom Probe Tips by Laser Machining;Microscopy Today;2019-10-29

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