Gate Stack Resistance and Limits to CMOS Logic Performance-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Gate Stack Resistance and Limits to CMOS Logic Performance

Published:2014-08 Issue:8 Volume:61 Page:2318-2325
ISSN:1549-8328
Container-title:IEEE Transactions on Circuits and Systems I: Regular Papers
language:
Short-container-title:IEEE Trans. Circuits Syst. I

Author:

Wachnik Richard A.,Lee Sungjae,Pan Li-Hong,Li Hongmei,Lu Ning,Wang Jing,Bernicot Christophe,Bingert Raphael,Randall Mai,Springer Scott K.,Putnam Christopher S.

Funder

independent Bulk CMOS and SOI technology development projects at the IBM Microelectronics, Div. Semiconductor Research & Development Center, Hopewell Junction, NY

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering

Link

http://xplorestaging.ieee.org/ielx7/8919/6863726/06827982.pdf?arnumber=6827982

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Case Studies in the Evaluation of Novel Transistors;RF and Time-domain Techniques for Evaluating Novel Semiconductor Transistors;2021-12-16

2. AC Device Variability in High- $\kappa$ Metal-Gate CMOS Technology;IEEE Electron Device Letters;2019-01

3. Extraction of Drain Current Thermal Noise in a 28 nm High- ${k}$ /Metal Gate RF CMOS Technology;IEEE Transactions on Electron Devices;2018-06

4. Parasitic Gate Resistance Impact on Triple-Gate FinFET CMOS Inverter;IEEE Transactions on Electron Devices;2016-07

5. Titanium Silicide/Titanium Nitride Full Metal Gates for Dual-Channel Gate-First CMOS;IEEE Electron Device Letters;2016-02

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP