Author:
Yang Haoyu,Li Shuhe,Ma Yuzhe,Yu Bei,Y. Young Evangeline F.
Cited by
14 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Ultrafast Source Mask Optimization via Conditional Discrete Diffusion;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2024-07
2. Edge Pair-Based Layout Pattern Matching using Space-filling Curve;2024 2nd International Symposium of Electronics Design Automation (ISEDA);2024-05-10
3. A deep learning workflow to generate free-form masks for grayscale lithography;DTCO and Computational Patterning III;2024-04-10
4. Feedback-based Selective Attenuated Phase Shift Mask for Improved Resist Profile Generation in Optical Lithography;2024 8th IEEE Electron Devices Technology & Manufacturing Conference (EDTM);2024-03-03
5. RL-OPC: Mask Optimization With Deep Reinforcement Learning;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2024-01