Author:
Zandbergen P.,VanSteenwinckel D.,Lammers J.H.,Kwinten H.,Juffermans C.
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Industrial and Manufacturing Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Cited by
4 articles.
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1. Process and Resist Parameters Influencing the MEEF Values for Sub-90nm Cntact Hole Patterns;Journal of Photopolymer Science and Technology;2008
2. Plasma Etch;Handbook of Semiconductor Manufacturing Technology, Second Edition;2007-07-09
3. Thermal treatment for optical proximity correction;Microelectronic Engineering;2007-05
4. Thermal effects study of chemically amplified resist;SPIE Proceedings;2006-03-10