Interface-Engineered Ge (100) and (111), N- and P-FETs with High Mobility-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Interface-Engineered Ge (100) and (111), N- and P-FETs with High Mobility

Published:2007-12 Issue: Volume: Page:
ISSN:
Container-title:2007 IEEE International Electron Devices Meeting
language:
Short-container-title:

Author:

Kuzum Duygu,Pethe Abhijit J.,Krishnamohan Tejas,Oshima Yasuhiro,Sun Yun,McVittie Jim P.,Pianetta Piero A.,McIntyre Paul C.,Saraswat Krishna C.

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx5/4418847/4418848/04419048.pdf?arnumber=4419048

Cited by 90 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Tightly Stacked 3D Diamond-Shaped Ge Nanowire Gate-All-Around FETs With Superior nFET and pFET Performance;IEEE Electron Device Letters;2021-12

2. Operation of (111) Ge-on-Insulator n-Channel MOSFET Fabricated by Smart-Cut Technology;IEEE Electron Device Letters;2020-07

3. Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks;ACS Applied Electronic Materials;2020-03-24

4. Reduction of Slow Trap Density in Al2O3/GeO x N y /n-Ge MOS Interfaces by PPN-PPO Process;IEEE Transactions on Electron Devices;2019-12

5. A study of stoichiometric composition of Ge thermal oxide by X-ray photoelectron spectroscopic depth profiling;Materials Today: Proceedings;2019

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP