Analytical Modeling and Characterization of Electromigration Effects for Multibranch Interconnect Trees

Author:

Chen Hai-Bao,Tan Sheldon X.-D.,Huang Xin,Kim Taeyoung,Sukharev Valeriy

Funder

National Science Foundation

Semiconductor Research Corporation

Shanghai Jiao Tong University through the 985 Research Fund

National Natural Science Foundation of China

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Computer Graphics and Computer-Aided Design,Software

Cited by 47 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

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2. A Graph-Learning-Driven Prediction Method for Combined Electromigration and Thermomigration Stress on Multi-Segment Interconnects;2024 Design, Automation & Test in Europe Conference & Exhibition (DATE);2024-03-25

3. Analytical Post-Voiding Modeling and Efficient Characterization of EM Failure Effects Under Time-Dependent Current Stressing;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2023-12

4. Linear Time Electromigration Analysis Based on Physics-Informed Sparse Regression;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2023-11

5. Frequency-Domain Transient Electromigration Analysis Using Circuit Theory;2023 IEEE/ACM International Conference on Computer Aided Design (ICCAD);2023-10-28

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