GAN-OPC: Mask Optimization With Lithography-Guided Generative Adversarial Nets-Reference-Cited by-同舟云学术

GAN-OPC: Mask Optimization With Lithography-Guided Generative Adversarial Nets

Published:2020-10 Issue:10 Volume:39 Page:2822-2834
ISSN:0278-0070
Container-title:IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
language:
Short-container-title:IEEE Trans. Comput.-Aided Des. Integr. Circuits Syst.

Author:

Yang Haoyu^ORCID,Li Shuhe,Deng Zihao,Ma Yuzhe^ORCID,Yu Bei^ORCID,Young Evangeline F. Y.

Funder

Research Grants Council of Hong Kong

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Computer Graphics and Computer-Aided Design,Software

Link

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