Enhanced Optimal Multi-Row Detailed Placement for Neighbor Diffusion Effect Mitigation in Sub-10 nm VLSI-Reference-Cited by-同舟云学术

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Enhanced Optimal Multi-Row Detailed Placement for Neighbor Diffusion Effect Mitigation in Sub-10 nm VLSI

Published:2019-09 Issue:9 Volume:38 Page:1703-1716
ISSN:0278-0070
Container-title:IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
language:
Short-container-title:IEEE Trans. Comput.-Aided Des. Integr. Circuits Syst.

Author:

Han Changho,Kahng Andrew B.,Wang Lutong^ORCID,Xu Bangqi

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Computer Graphics and Computer-Aided Design,Software

Link

http://xplorestaging.ieee.org/ielx7/43/8807328/08418726.pdf?arnumber=8418726

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A Leakage Analysis Methodology Considering Intra-Cell and Inter-Cell Layout Dependent Effect;2024 International VLSI Symposium on Technology, Systems and Applications (VLSI TSA);2024-04-22

2. Design Technology Co-Optimization and Time-Efficient Verification for Enhanced Pin Accessibility in the Post-3-nm Node;IEEE Access;2024

3. Design of Digital Integrated Circuits by Improving the Characteristics of Digital Cells;Machine Learning-based Design and Optimization of High-Speed Circuits;2023-12-31

4. Spacing Cost-aware Optimal and Efficient Mixed-Cell-Height Detailed Placement for DFM Considerations;2023 IEEE/ACM International Conference on Computer Aided Design (ICCAD);2023-10-28

5. A Fast Optimal Double-row Legalization Algorithm;ACM Transactions on Design Automation of Electronic Systems;2023-09-08

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