Overlay-Aware Detailed Routing for Self-Aligned Double Patterning Lithography Using the Cut Process
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Published:2016-09
Issue:9
Volume:35
Page:1519-1531
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ISSN:0278-0070
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Container-title:IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
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language:
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Short-container-title:IEEE Trans. Comput.-Aided Des. Integr. Circuits Syst.
Author:
Liu Iou-Jen,Fang Shao-Yun,Chang Yao-Wen
Funder
Genesys Logic
IBM
MediaTek
TSMC
Academia Sinica
MOST of Taiwan
National Taiwan University (NTU)
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Computer Graphics and Computer-Aided Design,Software
Cited by
6 articles.
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