Mining Lithography Hotspots from Massive SEM Images Using Machine Learning Model-Reference-Cited by-同舟云学术

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Mining Lithography Hotspots from Massive SEM Images Using Machine Learning Model

Published:2021-03-14 Issue: Volume: Page:
ISSN:
Container-title:2021 China Semiconductor Technology International Conference (CSTIC)
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Author:

Zhou Tao,Xu Bowen,Li Chen,Diao Xuling,Yan Yan,Chen Shoumian,Zhao Yuhan,Zhou Kan,Zhou Wenzhan,Zeng Xuan,Shi Xuelong

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/9461249/9461251/09461533.pdf?arnumber=9461533

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. AI/ML algorithms and applications in VLSI design and technology;Integration;2023-11

2. An Innovative Lithography Process Window Decision Based On Aggregation of Multi Machine Learning Approaches;2023 International Workshop on Advanced Patterning Solutions (IWAPS);2023-10-26

3. Semiconductor Defect Detection by Hybrid Classical-Quantum Deep Learning;2022 IEEE/CVF Conference on Computer Vision and Pattern Recognition (CVPR);2022-06

4. Hybrid Quantum-Classical Machine Learning for Lithography Hotspot Detection;2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC);2022-05-02

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