Analysis of resistivity in nano-interconnect: full range (4.2-300 K) temperature characterization-Reference-Cited by-同舟云学术

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Analysis of resistivity in nano-interconnect: full range (4.2-300 K) temperature characterization

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Container-title:Proceedings of the IEEE 2003 International Interconnect Technology Conference (Cat. No.03TH8695)
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Author:

Guillaumond J.F.,Arnaud L.,Mourier T.,Fayolle M.,Pesci O.,Reimbold G.

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx5/8650/27411/01219733.pdf?arnumber=1219733

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