Increased Multilayer Fabrication and RF Characterization of a High-Density Stacked MIM Capacitor Based on Selective Etching-Reference-Cited by-同舟云学术

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Increased Multilayer Fabrication and RF Characterization of a High-Density Stacked MIM Capacitor Based on Selective Etching

Published:2014-07 Issue:7 Volume:61 Page:2302-2308
ISSN:0018-9383
Container-title:IEEE Transactions on Electron Devices
language:
Short-container-title:IEEE Trans. Electron Devices

Author:

Tseng Victor Farm-Guoo,Xie Huikai

Funder

ARPA-E

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx7/16/6837542/06824796.pdf?arnumber=6824796

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Metal–insulator–metal micro-capacitors for integrated energy storage up to 10⁵ Hz;Journal of Physics D: Applied Physics;2022-09-20

2. Laser-Assisted and Additively Manufactured Multilayer Metal-Insulator-Metal Capacitors;2022 IEEE 22nd Annual Wireless and Microwave Technology Conference (WAMICON);2022-04-27

3. Compact Multilayer Bandpass Filter Using Low-Temperature Additively Manufacturing Solution;IEEE Transactions on Electron Devices;2021-07

4. Physical Modeling of Monolithic Self-rolled-up Microtube Interdigital Capacitors;IEEE Transactions on Components, Packaging and Manufacturing Technology;2021

5. Study of effective permittivity for a multilayer substrate dipole antenna;International Journal of Microwave and Wireless Technologies;2020-11-27

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