Author:
Tang Mao-Chyuan,Fang Yean-Kuen,Chen David C.,Yeh Chune-Sin
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Cited by
2 articles.
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1. High-k Gate Dielectric Nano-FET Leakage Current Analysis;2021 IEEE 19th Student Conference on Research and Development (SCOReD);2021-11-23
2. Gate leakage current of NMOSFET with ultra-thin gate oxide;Journal of Central South University;2012-11