Retrograde-Mask Processed Polysilicon TFT for High Performance, Planar Structure, and Stable Operation
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Published:2015-08
Issue:8
Volume:36
Page:790-792
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ISSN:0741-3106
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Container-title:IEEE Electron Device Letters
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language:
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Short-container-title:IEEE Electron Device Lett.
Author:
Jae Hyo Park ,Hyung Yoon Kim ,Ki Hwan Seok ,Kiaee Zohreh,Sol Kyu Lee ,Hee Jae Chae ,Yong Hee Lee ,Jae Ho Lee ,Seung Ki Joo
Funder
BK21PLUS SNU Materials Division for Educating Creative Global Leaders
Eui-San Research Center and Research Institute of Advanced Materials, Seoul National University, Seoul, Korea.
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials