Effects of Surface Passivation and Deposition Methods on the 1/ $f$ Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors

Author:

Do Thanh Ngoc Thi,Malmros Anna,Gamarra Piero,Lacam Cedric,Di Forte-Poisson Marie-Antoinette,Tordjman Maurice,Horberg Mikael,Aubry Raphael,Rorsman Niklas,Kuylenstierna Dan

Funder

GigaHertz Center in a joint project financed by the Swedish Governmental Agency of Innovation Systems (VINNOVA), Chalmers University of Technology, RUAG AB, and Ericsson AB

MANGA project financed by the Swedish Defence Material Administration

Swedish Foundation for Strategic Research (SSF)

Swedish Research Council (VR)

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

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1. A Review of Degradation in GaN Based HEMTs;2024 9th International Conference on Electronic Technology and Information Science (ICETIS);2024-05-17

2. The Study of the Material Principle and Physical Characteristic Analysis of eGaN FETs;Journal of Physics: Conference Series;2023-07-01

3. Recent developments in materials, architectures and processing of AlGaN/GaN HEMTs for future RF and power electronic applications: A critical review;Micro and Nanostructures;2022-08

4. Low-frequency noise characterization of AlGaN/GaN HEMTs with and without a p-GaN gate layer;Semiconductor Science and Technology;2021-11-15

5. DC Characteristics and Low-Frquency Noise of AlGaN/GaN HEMTs with Different Gate-to-Source Lengths;2021 IEEE International Symposium on Radio-Frequency Integration Technology (RFIT);2021-08-25

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