Highly Robust Flexible Oxide Thin-Film Transistors by Bulk Accumulation-Reference-Cited by-同舟云学术

Highly Robust Flexible Oxide Thin-Film Transistors by Bulk Accumulation

Published:2015-08 Issue:8 Volume:36 Page:811-813
ISSN:0741-3106
Container-title:IEEE Electron Device Letters
language:
Short-container-title:IEEE Electron Device Lett.

Author:

Xiuling Li ,Billah Mohammad Masum,Mativenga Mallory,Di Geng ,Yong-Hwan Kim ,Tae-Woong Kim ,Young-Gug Seol ,Jin Jang

Funder

Industrial Strategic Technology Development Program through the Ministry of Trade, Industry and Energy/Korea Evaluation Institute of Industrial Technologies

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx7/55/7164361/07140762.pdf?arnumber=7140762

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