FeN/AlN multilayer films for high moment thin film recording heads
Author:
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
http://xplorestaging.ieee.org/ielx1/20/11569/00538673.pdf?arnumber=538673
Cited by 10 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Soft magnetic properties and high frequency permeability in [CoAlO/oxide] multilayer films;Journal of Physics D: Applied Physics;2007-05-18
2. Effect of seed and interface layers on the magnetic properties of laminated Fe-Al-N films;IEEE Transactions on Magnetics;2003-01
3. Nanoindentation and microtribological behavior of Fe–N/Ti–N multilayers with different thickness of Ti–N layers;Wear;2001-10
4. Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering;Applied Physics A Materials Science & Processing;2001-08
5. Nanoindentation and nanotribological behavior of Fe-N/Ti-N multilayers with different thickness of Fe-N layers;Wear;2001-01
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