A Large-area Nanograting as SERS Substrate by Displacement Talbot Lithography-Reference-Cited by-同舟云学术

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A Large-area Nanograting as SERS Substrate by Displacement Talbot Lithography

Published:2023-07-31 Issue: Volume: Page:
ISSN:
Container-title:2023 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)
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Author:

Wang Yue¹,Dong Litong¹,Liu Mengnan¹,Ouyang Mingzhao²,Yang Jie²,Zhang Zhibo¹,Cao Wenxiao³

Affiliation:

1. Changchun University of Science and Technology,JR3CN&CNM,Changchun,China

2. Changchun University of Science and Technology,School of Optoelectronic Engineering

3. Changchun University of Science and Technology,School of Electronics and Information Engineering,Changchun,China

Funder

Education Department of Jilin Province

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/10305274/10305299/10305402.pdf?arnumber=10305402

Reference21 articles.

1. Understanding resolution limit of displacement Talbot lithography

2. Fabrication of Au thin film gratings by pulsed laser interference

3. SPPs characteristics of Ag/SiO2 sinusoidal nano-grating in SERS application

4. One-step formation of a plasmonic grating with an ultranarrow resonance linewidth for sensing

5. Optimization of displacement Talbot lithography for fabrication of uniform high aspect ratio gratings

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