Low-pressure chemical vapor deposition for very large-scale integration processing

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Low-pressure chemical vapor deposition for very large-scale integration processing—A review

Published:1979-04 Issue:4 Volume:26 Page:647-657
ISSN:0018-9383
Container-title:IEEE Transactions on Electron Devices
language:
Short-container-title:IEEE Trans. Electron Devices

Author:

Kern W.,Schnable G.L.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx5/16/31788/01480051.pdf?arnumber=1480051

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