Surface passivation of boron diffused emitters for high efficiency solar cells
Author:
Affiliation:
1. Fraunhofer Institute for Solar Energy Systems, Heidenhofstr. 2, 79110 Freiburg, Germany
2. Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB, The Netherlands
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx5/4815197/4922425/04922637.pdf?arnumber=4922637
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Effect of Induced Charges on the Performance of Different Dielecteric Layers of c-Si Solar Cell by Experimental and Theoretical Approach;Silicon;2020-01-02
2. Surface passivation of crystalline silicon solar cells: Present and future;Solar Energy Materials and Solar Cells;2018-12
3. Passivation of c-Si surfaces by ALD tantalum oxide capped with PECVD silicon nitride;Solar Energy Materials and Solar Cells;2015-11
4. Excellent boron emitter passivation for high-efficiency Si wafer solar cells using AlOx/SiNx dielectric stacks deposited in an industrial inline plasma reactor;Progress in Photovoltaics: Research and Applications;2012-02
5. Microsystems enabled photovoltaics: 14.9% efficient 14μm thick crystalline silicon solar cell;Solar Energy Materials and Solar Cells;2011-02
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