Optimization of RF Frequencies in Dual-frequency Capacitively Coupled Plasma Apparatus Using Genetic Algorithm (GA) and Plasma Simulation-Reference-Cited by-同舟云学术

Optimization of RF Frequencies in Dual-frequency Capacitively Coupled Plasma Apparatus Using Genetic Algorithm (GA) and Plasma Simulation

Published:2022-12-12 Issue: Volume: Page:
ISSN:
Container-title:2022 International Symposium on Semiconductor Manufacturing (ISSM)
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Author:

Takagi Shigeyuki¹,Nakaegawa Tatsuhiro²,Hsiao Shih-Nan³,Sekine Makoto³

Affiliation:

1. School of Engineering, Tokyo University of Technology,Department of electrical and electronic Engineering,Hachioji,Japan

2. School of Engineering, Tokyo University of Japan,Department of electrical and electronic Engineering,Hachioji,Japan

3. Nagoya University,Center for Low-temperature Plasma Sciences,Nagoya,Japan

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/10026850/10026886/10026920.pdf?arnumber=10026920

Reference10 articles.

1. Genetic Algorithms

2. Adaptation in natural and artificial systems: an introductory analysis with applications to biology, control, and artificial intelligence;holland;University of Michigan Press,1975

3. Survey of multi-objective optimization methods for engineering

4. Electron Heating in Dual-Radio-Frequency-Driven Atmospheric-Pressure Plasmas

5. Dual radio frequency sources in a magnetized capacitively coupled plasma discharge

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Optimization of RF Frequencies in Dual-Frequency Capacitively Coupled Plasma Apparatus Using Genetic Algorithm (GA) and Plasma Simulation;IEEE Transactions on Semiconductor Manufacturing;2023-11

2. Optimization of uniformity in plasma ashing process using genetic programming;Journal of Physics D: Applied Physics;2023-05-26