Integrated Fabrication Process of Si Microcantilever Using TMAH Solution With Planar Molybdenum Mask-Reference-Cited by-同舟云学术

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Integrated Fabrication Process of Si Microcantilever Using TMAH Solution With Planar Molybdenum Mask

Published:2023-06 Issue:3 Volume:32 Page:290-296
ISSN:1057-7157
Container-title:Journal of Microelectromechanical Systems
language:
Short-container-title:J. Microelectromech. Syst.

Author:

Aprilia Lia¹^ORCID,Meguro Tatsuya²^ORCID,Nuryadi Ratno¹^ORCID,Tabei Tetsuo²,Mimura Hidenori³^ORCID,Kuroki Shin-Ichiro²^ORCID

Affiliation:

1. Research Center for Photonics, Research Organization of Nanotechnology and Materials, National Research and Innovation Agency, South Tangerang, Banten, Indonesia

2. Research Institute for Nanodevices, Hiroshima University, Higashihiroshima, Hiroshima, Japan

3. Research Institute of Electronics, Shizuoka University, Hamamatsu, Shizuoka, Japan

Funder

Cooperative Research Project of the Research Center for Biomedical Engineering

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Mechanical Engineering

Link

http://xplorestaging.ieee.org/ielx7/84/10142033/10093960.pdf?arnumber=10093960

Reference35 articles.

1. Anisotropic etching of silicon in TMAH solutions;tabata;Sensors Mater,2001

2. On the Miller-indices determination of Si{1 0 0}convex corner undercut planes

3. Silicon as a mechanical material

4. A new model for Si{100}convex corner undercutting in anisotropic KOH etching

5. Fabrication of molybdenum MEMs structures using dry and wet etching;chauhan;Proc Int Symp VLSI Design Autom Test,2018

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