Analysis and Optimization of Order Overlap in Echelle Imaging Spectrometers-Reference-Cited by-同舟云学术

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Analysis and Optimization of Order Overlap in Echelle Imaging Spectrometers

Published:2024-03-01 Issue:5 Volume:36 Page:341-344
ISSN:1041-1135
Container-title:IEEE Photonics Technology Letters
language:
Short-container-title:IEEE Photon. Technol. Lett.

Author:

Zhang Lei¹^ORCID,Li Bo¹^ORCID,Li Hanshuang¹^ORCID,Gu Guochao¹^ORCID,Wang Xiaoxu¹^ORCID,Kong Xiangjin¹

Affiliation:

1. Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, China

Funder

National Natural Science Foundation of China

Strategic Priority Research Program of the Chinese Academy of Sciences

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Link

http://xplorestaging.ieee.org/ielx7/68/10412694/10379020.pdf?arnumber=10379020

Reference26 articles.

1. Development and application of imaging spectrometer (invited);Yu;Infr. Laser Eng.,2022

2. Review of high fidelity imaging spectrometer design for remote sensing

3. Echelle Grating Spectrometers in Analytical Spectrometry

4. The high-resolution Echelle Spectrograph of the 6-m telescope of the special astrophysical observatory

5. Echelle dif fraction grating based high-resolution spectrometer-on-chip on SiON waveguide platform

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1. A synchronous-fluorescence analysis method combing with simple one-step extraction for determination of leonurine in traditional Chinese medicine;Analytical Methods;2024

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