Self-Assembled Monolayer Patterning for PolySi/SiO<sub>2</sub> Passivated Contacts-Reference-Cited by-同舟云学术

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Self-Assembled Monolayer Patterning for PolySi/SiO₂ Passivated Contacts

Published:2023-06-11 Issue: Volume: Page:
ISSN:
Container-title:2023 IEEE 50th Photovoltaic Specialists Conference (PVSC)
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Author:

Nemeth B.¹,Young D.L.¹,Page M.R.¹,LaSalvia V.¹,Theingi S.¹,Stradins P.¹

Affiliation:

1. National Renewable Energy Laboratory,Golden,Colorado, CO,USA,80401

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/10359507/10359504/10359621.pdf?arnumber=10359621

Reference4 articles.

1. Tailoring Surfaces with Silanes;Arkles;Chemtech,1977

2. Molecular Self-Assembled Monolayers and Multilayers for Organic and Unconventional Inorganic Thin-Film Transistor Applications

3. Engineering Silicon Oxide Surfaces Using Self-Assembled Monolayers

4. Deep UV photochemistry and patterning of self-assembled monolayer films

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