A 7nm FinFET SRAM using EUV lithography with dual write-driver-assist circuitry for low-voltage applications-Reference-Cited by-同舟云学术

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A 7nm FinFET SRAM using EUV lithography with dual write-driver-assist circuitry for low-voltage applications

Published:2018-02 Issue: Volume: Page:
ISSN:
Container-title:2018 IEEE International Solid - State Circuits Conference - (ISSCC)
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Author:

Song Taejoong,Jung Jonghoon,Rim Woojin,Kim Hoonki,Kim Yongho,Park Changnam,Do Jeongho,Park Sunghyun,Cho Sungwee,Jung Hyuntaek,Kwon Bongjae,Choi Hyun-Su,Choi JaeSeung,Yoon Jong Shik

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/8304413/8310156/08310252.pdf?arnumber=8310252

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