An All-Digital On-Chip Process-Control Monitor for Process-Variability Measurements-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

An All-Digital On-Chip Process-Control Monitor for Process-Variability Measurements

Published:2008-02 Issue: Volume: Page:
ISSN:
Container-title:2008 IEEE International Solid-State Circuits Conference - Digest of Technical Papers
language:
Short-container-title:

Author:

Klass Fabian,Jain Ashish,Hess Greg,Park Brian

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx5/4497158/4523032/04523230.pdf?arnumber=4523230

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Ferroelectric Materials: Enabling Programmable Process Control Monitors;2022 IEEE Physical Assurance and Inspection of Electronics (PAINE);2022-10-25

2. Design of Low-Cost Test Structures for Measuring Within-Die Process Skew Variations;2022 IEEE 34th International Conference on Microelectronic Test Structures (ICMTS);2022-03-21

3. Mitigating the Length of Diffusion Effect by Back-End Design-Technology Cooptimization;IEEE Transactions on Electron Devices;2022-03

4. Wide-Supply-Range All-Digital Leakage Variation Sensor for On-Chip Process and Temperature Monitoring;IEEE Journal of Solid-State Circuits;2015-11

5. On-Chip Process and Temperature Monitor for Self-Adjusting Slew Rate Control of 2$\,\times\,$VDD Output Buffers;IEEE Transactions on Circuits and Systems I: Regular Papers;2013-06

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP