Variability Modeling and Process Optimization for the 32 nm BEOL Using In-Line Scatterometry Data
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Published:2014-05
Issue:2
Volume:27
Page:260-268
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ISSN:0894-6507
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Container-title:IEEE Transactions on Semiconductor Manufacturing
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language:
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Short-container-title:IEEE Trans. Semicond. Manufact.
Author:
Faruk M. Golam,Angyal Matthew S.,Ogunsola Oluwafemi,Watts David K.,Wilkins R.
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Industrial and Manufacturing Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials