Demonstration of Ultraviolet μLED Array With Novel Electrical Contact Etch Mask
Author:
Affiliation:
1. Electrical and Microelectronic Engineering Department, Rochester Institute of Technology, Rochester, NY, USA
2. Innovation Semiconductor Inc., Rochester, NY, USA
Funder
National Science Foundation
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics
Link
https://ieeexplore.ieee.org/ielam/3/10257665/10237239-aam.pdf
Reference42 articles.
1. Photocatalysis from UV/Vis to Near-Infrared Light: Towards Full Solar-Light Spectrum Activity
2. Oxidized Ni/Pt and Ni/Au ohmic contacts to p-type GaN
3. Multidirectional UV-LED lithography using an array of high-intensity UV-LEDs and tilt-rotational sample holder for 3-D microfabrication
4. Top-down GaN nanowire transistors with nearly zero gate hysteresis for parallel vertical electronics
5. Influence of size-reduction on the performances of GaN-based micro-LEDs for display application
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