Microstructure and Electrical Properties of Amorphous $ \hbox{Bi}_{5}\hbox{Nb}_{3}\hbox{O}_{15}$ Films Grown on Cu/Ti/$ \hbox{SiO}_{2}$/Si Substrates Using RF Magnetron Sputtering-Reference-Cited by-同舟云学术

Microstructure and Electrical Properties of Amorphous $ \hbox{Bi}_{5}\hbox{Nb}_{3}\hbox{O}_{15}$ Films Grown on Cu/Ti/$ \hbox{SiO}_{2}$/Si Substrates Using RF Magnetron Sputtering

Published:2011-05 Issue:5 Volume:58 Page:1462-1467
ISSN:0018-9383
Container-title:IEEE Transactions on Electron Devices
language:
Short-container-title:IEEE Trans. Electron Devices

Author:

Kim Jin-Seong,Cho Kyung-Hoon,Kang Lee-Seung,Sun Jong-Woo,Paik Dong-Soo,Seong Tae-Geun,Kang Chong-Yun,Kim Jong-Hee,Sung Tae-Hyun,Nahm Sahn

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx5/16/5753310/05721800.pdf?arnumber=5721800

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