Half pitch 14 nm direct pattering with Nanoimprint lithography-Reference-Cited by-同舟云学术

Half pitch 14 nm direct pattering with Nanoimprint lithography

Published:2018-12 Issue: Volume: Page:
ISSN:
Container-title:2018 IEEE International Electron Devices Meeting (IEDM)
language:
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Author:

Nakasugi T.,Kono T.,Fukuhara K.,Hatano M.,Tokue H.,Komori M.,Tsuda H.,Komukai T.,Takahata K.,Kato H.,Kobayashi K.,Mitra A.,Kobayashi S.,Inoue S.,Higashiki T.,Motokawa T.,Saito M.,Kanamitsu S.,Itoh M.,Imamura T.,Matasunaga K.,Hashimoto K.,Kim Y.,Cho J.,Jung W.

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/8601505/8614478/08614578.pdf?arnumber=8614578

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