UV-LED Lithography System and Characterization-Reference-Cited by-同舟云学术

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UV-LED Lithography System and Characterization

Published:2020-09-27 Issue: Volume: Page:
ISSN:
Container-title:2020 IEEE 15th International Conference on Nano/Micro Engineered and Molecular System (NEMS)
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Author:

Shiba Sabera Fahmida,Beavers Jace,Laramore Diego,Lindstrom Bo,Brovles James,Gaither Corey,Hieber Tyler,Kim Jungkwun J.K.

Funder

Korea Institute for Advancement of Technology

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/9265537/9265518/09265607.pdf?arnumber=9265607

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Development of Programmable UV-LED Microlithography System for 3D Microfabrication;Journal of Microelectromechanical Systems;2022-02

2. Accessible, large-area, uniform dose photolithography using a moving light source;Journal of Micromechanics and Microengineering;2021-12-20

3. Low-threshold wavelength-tunable ultraviolet vertical-cavity surface-emitting lasers from 376 to 409 nm;Fundamental Research;2021-11

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