Diagnostics of Inductively Coupled Plasma Under the Influence of Immersed RF Self-Biased Substrate Electrode-Reference-Cited by-同舟云学术

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Diagnostics of Inductively Coupled Plasma Under the Influence of Immersed RF Self-Biased Substrate Electrode

Published:2023 Issue: Volume: Page:1-8
ISSN:0093-3813
Container-title:IEEE Transactions on Plasma Science
language:
Short-container-title:IEEE Trans. Plasma Sci.

Author:

Karar Partha¹,Kumar Gourav¹,Kar Rajib²^ORCID,Patil D. S.¹^ORCID,Dusane Rajiv O.¹^ORCID

Affiliation:

1. Department of Metallurgical Engineering and Materials Science, Semiconductor Thin Film and Plasma Processing Laboratory, Indian Institute of Technology Bombay, Mumbai, Maharashtra, India

2. Laser and Plasma Surface Processing Section, Bhabha Atomic Research Centre, Trombay, Mumbai, India

Funder

Department of Science and Technology, Ministry of Science and Technology, India

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Condensed Matter Physics,Nuclear and High Energy Physics

Link

http://xplorestaging.ieee.org/ielx7/27/4360151/10325428.pdf?arnumber=10325428

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