Predictive Simulation of Advanced Nano-CMOS Devices Based on kMC Process Simulation

Author:

Mok K.R.C.,Colombeau B..,Benistant F..,Teo R.S.,Yeong S.H.,Yang B..,Jaraiz M..,Chu S.-F.S.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

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3. Atomic Structure of 180? Ferroelectric Domain Walls in PbTiO3;Handbook of Micromechanics and Nanomechanics;2013-04-08

4. Insights to emitter saturation current densities of boron implanted samples based on defects simulations;AIP Conference Proceedings;2012

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