A new technique for fabrication of OEICs-the etched back planar process-and its application to the fabrication of planar embedded InP-InGaAs p-i-n photodiodes
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Published:1990-10
Issue:10
Volume:2
Page:721-723
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ISSN:1041-1135
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Container-title:IEEE Photonics Technology Letters
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language:
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Short-container-title:IEEE Photon. Technol. Lett.
Author:
Shimizu J.,Inomoto Y.,Kida N.,Terakado T.,Suzuki A.
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Cited by
1 articles.
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