Mismatch in diffusion resistors caused by photolithography-Reference-Cited by-同舟云学术

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Mismatch in diffusion resistors caused by photolithography

Published:2003-05 Issue:2 Volume:16 Page:181-186
ISSN:0894-6507
Container-title:IEEE Transactions on Semiconductor Manufacturing
language:en
Short-container-title:IEEE Trans. Semicond. Manufact.

Author:

Hausser S.,Majoni S.,Schligtenhorst H.,Kolwe G.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Industrial and Manufacturing Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx5/66/26960/01198026.pdf?arnumber=1198026

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A CMOS threshold voltage reference source for very-low-voltage applications;Microelectronics Journal;2008-12

2. An Ultra Low-Voltage Ultra Low-Power CMOS Threshold Voltage Reference;IEICE Transactions on Electronics;2007-10-01

3. Electrical Measurement of On-Mask Mismatch Resistor Structures;2007 IEEE International Conference on Microelectronic Test Structures;2007-03

4. Behavior of Reaction Products during Puddle Development in Fabrication of Ultralarge-Scale Integrations;Journal of The Electrochemical Society;2007

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