Author:
Ming-Chung Liang ,Hsin-Yi Tsai ,Chia-Chi Chung ,Cheng-Chen Hsueh ,Chung H.,Chih-Yuan Lu
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Cited by
2 articles.
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1. Controlling Asymmetric Photoresist Feature Dimensions during Plasma-Assisted Shrink;Plasma Processes and Polymers;2014-05-20
2. Plasma Etch;Handbook of Semiconductor Manufacturing Technology, Second Edition;2007-07-09