Thin-Film Deposition With Refractory Materials Using a Vacuum Arc-Reference-Cited by-同舟云学术

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Thin-Film Deposition With Refractory Materials Using a Vacuum Arc

Published:2015-08 Issue:8 Volume:43 Page:2323-2328
ISSN:0093-3813
Container-title:IEEE Transactions on Plasma Science
language:
Short-container-title:IEEE Trans. Plasma Sci.

Author:

Beilis Isak I.,Koulik Yosef,Yankelevich Yefim,Arbilly David,Boxman Raymond L.

Funder

Israel Academy of Sciences and Humanities through the Israel Science Foundation

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Condensed Matter Physics,Nuclear and High Energy Physics

Link

http://xplorestaging.ieee.org/ielx7/27/7182252/07161380.pdf?arnumber=7161380

Cited by 17 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Thin Zr Film Deposition Using a Refractory Anode Vacuum Arc Plasma Source;IEEE Transactions on Plasma Science;2022-09

2. Thin Zr Film Deposition Using a Refractory Anode Vacuum Arc Plasma Source;2020 29th International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV);2021-09-27

3. Advanced Concepts and Architectures for Plasma-Enabled Material Processing;Synthesis Lectures on Emerging Engineering Technologies;2020-09-30

4. Recent progress in research on micro-cathode arc thrusters;The European Physical Journal D;2020-05

5. Diffuse vacuum arc with heated cathode made of ceramic (CeO2) and metal (Cr) mixture;Plasma Sources Science and Technology;2020-01-22

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